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Near-Field Profilers
Makes measuring small beams easy with microscope objective lenses
Near-field profiling is a common technique used to analyze small beams, and involves using a microscope objective lens to image the beam onto a the beam profiler. This technique extends the measurement range of the profiler. Near-field profiling is performed in fiber and waveguide analysis, lens characterization, and other applications where beams 50 microns or smaller are analyzed. Photon offers near-field profilers using either camera-based beam profilers or scanning slit profilers.
Camera-based Near Field Profiler
Photon offers a line of camera based near-field profilers based on the 2/3-inch USBeamPro CMOS camera and the 1/2-inch and 2/3-inch FireWire CCD cameras. The systems include the camera, ATP-SM continuously variable attenuator, bracket and 60X magnification microscope objective lens, with broadband AR coating. While there are more accurate techniques to measure these beam sizes, the camera provides two-dimensional information that cannot always be obtained through knife-edge or scanning slit methods.
Scanning Slit Near-Field Profilers
For laser systems that are unsuited to measurement with camera-based profilers, due to the wavelengths longer than 1100nm or power levels, Photon offers several models of Near-Field Profilers (NFPs) using the NanoScan slit scanner. These instruments are available to cover wavelengths from UV through far infrared. For higher power applications, expanding the size of a focused spot makes it possible to reduce the power density and make allow the measurement of beams with too high power densities to be measured without attenuation.
